Scanning Electron Microscopy (SEM)

Scanning Electron Microscopy (SEM) utilizes a focused electron beam across a sample surface, to provide high-resolution and long-depth-of-field images of the sample surface. SEM is one of the most widely used analytical tools in industry due to the extremely detailed images it can provide. Coupled to an auxiliary Energy Dispersive X-ray Spectroscopy (EDS) detector, this technique also offers elemental identification of nearly the entire periodic table.

SEM Technical Capabilities

Signal Detected:
Secondary & backscattered electrons and x-rays

Elements Detected:
B-U (EDS mode)

Detection Limits:
0.1 - 1 at%

Depth Resolution:
0.5 - 3 µm (EDS)

Imaging/Mapping:
Yes

Lateral Resolution/Probe Size:
15 - 45 Angstrom

Ideal Uses for SEM Analysis

• High resolution images
• Elemental microanalysis and particle characterization

Relevant Industries for SEM Analysis

• Aerospace
• Automotive
• Biomedical/biotechnology
• Compound Semiconductor
• Data Storage
• Defense
• Displays
• Electronics
• Industrial Products
• Lighting
• Pharmaceutical
• Photonics
• Polymer
• Semiconductor
• Solar Photovoltaics
• Telecommunications

Strengths of SEM Analysis

• Rapid, high-resolution imaging
• Quick identification of elements present
• Good depth of field
• Versatile platform that supports many other tools

Limitations of SEM Analysis

• Vacuum compatibility typically required
• May  need to etch for contrast
• SEM may spoil sample for subsequent analyses
• Size restrictions may require cutting the sample
• Ultimate resolution is a strong function of the sample and preparation